Indian Institute of Technology (IIT) Mandi is hosting International Workshop on Nano/Micro 2D & 3D fabrication and manufacturing of Electronic & Biomedical Devices and Applications (IWNEBD-2018) from October 31 to November 2, 2018. Leading engineers, industrialists, scientists and student researchers from all over the world have gathered to discuss the progress and future trends in Nano/Micro 2D- and 3D- fabrication technology.
The workshop at IIT Mandi will pave the way for universal idea exchange and collaboration.
“This will be the first workshop in India on advanced lithography with industry and academic leaders from the US, Taiwan and Singapore”, said Dr. Kenneth Gonsalves. “Focus will be on writing nanoscale 2D- and 3D- patterns using photons, electrons and ions, for advanced silicon chip devices” he added, about the miniaturization of lithographic techniques.
Not only this, during the international workshop, the Helium Ion Microscope (HIM) was unveiled along with a state-of-the-art class 100 clean room facility for device fabrication. This clean room facility, which will be part of the Centre for Design & Fabrication of Electronic Devices, is the first-of-its-kind in India.
“We set out with the desire for our research and academics to have an impact on the Indian society at large, and the Himalayan society in particular. To achieve this, we decided to focus on theoretical as well as experiential research and invested extensively in creating world-class facilities in materials research, electronic devices design and fabrication at IIT Mandi. What you see today [in terms of infrastructure at the institute] is a culmination of years of efforts,” said Prof. Timothy Gonsalves, Director, IIT Mandi while addressing the gathering at the workshop.
The event was inaugurated by R. Subrahmanyam, Secretary, Higher Education, MHRD. Some of the many other luminaries who are sharing their ideas and knowledge at the workshop includes Dr. Vivek Singh from Intel Corporation USA, Prof. V. Ramgopal Rao, Director of IIT Delhi, Prof. B. R. Mehta, also of IIT Delhi, Prof. Enakshi Bhattacharya and Prof. Nandita Dasgupta from IIT Madras, Prof. M. Jagadesh Kumar, VC of JNU, Delhi, Prof. Habil. Jörg Schulze from Germany, Prof. Kuen-Yu Tai from Taiwan, Dr. M. S. M. Saifullah from Singapore, and Prof. Ashok Srivastava, LSU, USA and Dr. Patrick Naulleau from Lawrence Berkeley National Laboratory USA.
India’s foray into micro- and nano-lithography will benefit from IIT Mandi’s international workshop, which will not only help in exchange of ideas and know-how among researchers, but also bring together academia, industry, public sector and the Government of India. Such collaboration will serve to identify and develop a “silicon mountain valley” in and around Mandi, to benefit from the research at the institute.